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| Titel |
Chamber simulation of photooxidation of dimethyl sulfide and isoprene in the presence of NOx |
| VerfasserIn |
T. Chen, M. Jang |
| Medientyp |
Artikel
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| Sprache |
Englisch
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| ISSN |
1680-7316
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| Digitales Dokument |
URL |
| Erschienen |
In: Atmospheric Chemistry and Physics ; 12, no. 21 ; Nr. 12, no. 21 (2012-11-06), S.10257-10269 |
| Datensatznummer |
250011564
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| Publikation (Nr.) |
 copernicus.org/acp-12-10257-2012.pdf |
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| Zusammenfassung |
| To improve the model prediction for the formation of H2SO4 and
methanesulfonic acid (MSA), aerosol-phase reactions of gaseous dimethyl
sulfide (DMS) oxidation products [e.g., dimethyl sulfoxide (DMSO)] in aerosol
have been included in the DMS kinetic model with the recently reported
gas-phase reactions and their rate constants. To determine the rate constants
of aerosol-phase reactions of both DMSO and its major gaseous products [e.g.,
dimethyl sulfone (DMSO2) and methanesulfinic acid (MSIA)], DMSO was
photooxidized in the presence of NOx using a 2 m3 Teflon film
chamber. The rate constants tested in the DMSO kinetic mechanisms were then
incorporated into the DMS photooxidation mechanism. The model simulation
using the newly constructed DMS oxidation mechanims was compared to chamber
data obtained from the phototoxiation of DMS in the presence of NOx.
Within 120-min simulation, the predicted concentrations of MSA increase by
200–400% and those of H2SO4, by 50–200% due to aerosol-phase
chemistry. This was well substantiated with experimental data. To study the
effect of coexisting volatile organic compounds, the photooxidation of DMS in
the presence of isoprene and NOx has been simulated using the newly
constructed DMS kinetic model integrated with the Master Chemical Mechanism
(MCM) for isoprene oxidation, and compared to chamber data. With the high
concentrations of DMS (250 ppb) and isoprene (560–2248 ppb), both the model
simulation and experimental data showed an increase in the yields of MSA and
H2SO4 as the isoprene concentration increased. |
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