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| Titel |
Secondary organic aerosol formation from phenolic compounds in the absence of NOx |
| VerfasserIn |
S. Nakao, C. Clark, P. Tang, K. Sato, D. Cocker III |
| Medientyp |
Artikel
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| Sprache |
Englisch
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| ISSN |
1680-7316
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| Digitales Dokument |
URL |
| Erschienen |
In: Atmospheric Chemistry and Physics ; 11, no. 20 ; Nr. 11, no. 20 (2011-10-27), S.10649-10660 |
| Datensatznummer |
250010149
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| Publikation (Nr.) |
 copernicus.org/acp-11-10649-2011.pdf |
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| Zusammenfassung |
| SOA formation from benzene, toluene, m-xylene, and their corresponding
phenolic compounds were investigated using the UCR/CE-CERT Environmental
Chamber to evaluate the importance of phenolic compounds as intermediate
species in aromatic SOA formation. SOA formation yield measurements coupled
to gas-phase yield measurements indicate that approximately 20% of the
SOA of benzene, toluene, and m-xylene could be ascribed to the phenolic route
under low NOx conditions. The SOA densities tend to be initially as
high as approximately 1.8 g cm−3 and eventually reach the range of
1.3–1.4 g cm−3. The final SOA density was found to be independent of
elemental ratio (O/C) indicating that applying constant density (e.g., 1.4 g cm−3)
to SOA formed from different aromatic compounds tested in this
study is a reasonable approximation. Results from a novel on-line PILS-TOFMS
(Particle-into-Liquid Sampler coupled with Agilent Time-of-Flight Mass
Spectrometer) are reported. Major signals observed by the on-line/off-line
Agilent TOFMS indicated that products had the same number of carbon atoms as
their parent aromatics, suggesting importance of ring-retaining products or
ring-opening products following ring-cleavage. |
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