dot
Detailansicht
Katalogkarte GBA
Katalogkarte ISBD
Suche präzisieren
Drucken
Download RIS
Hier klicken, um den Treffer aus der Auswahl zu entfernen
Titel Explicit modelling of SOA formation from α-pinene photooxidation: sensitivity to vapour pressure estimation
VerfasserIn R. Valorso, B. Aumont, M. Camredon, T. Raventos-Duran, C. Mouchel-Vallon, N. L. Ng, J. H. Seinfeld, J. Lee-Taylor, S. Madronich
Medientyp Artikel
Sprache Englisch
ISSN 1680-7316
Digitales Dokument URL
Erschienen In: Atmospheric Chemistry and Physics ; 11, no. 14 ; Nr. 11, no. 14 (2011-07-18), S.6895-6910
Datensatznummer 250009922
Publikation (Nr.) Volltext-Dokument vorhandencopernicus.org/acp-11-6895-2011.pdf
 
Zusammenfassung
The sensitivity of the formation of secondary organic aerosol (SOA) to the estimated vapour pressures of the condensable oxidation products is explored. A highly detailed reaction scheme was generated for α-pinene photooxidation using the Generator for Explicit Chemistry and Kinetics of Organics in the Atmosphere (GECKO-A). Vapour pressures (Pvap) were estimated with three commonly used structure activity relationships. The values of Pvap were compared for the set of secondary species generated by GECKO-A to describe α-pinene oxidation. Discrepancies in the predicted vapour pressures were found to increase with the number of functional groups borne by the species. For semi-volatile organic compounds (i.e. organic species of interest for SOA formation), differences in the predicted Pvap range between a factor of 5 to 200 on average. The simulated SOA concentrations were compared to SOA observations in the Caltech chamber during three experiments performed under a range of NOx conditions. While the model captures the qualitative features of SOA formation for the chamber experiments, SOA concentrations are systematically overestimated. For the conditions simulated, the modelled SOA speciation appears to be rather insensitive to the Pvap estimation method.
 
Teil von